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Facilities


Advanced Materials Facility - CVD, Plasma Processing, and Laser Diagnostics Lab featuring:

  1. 5 Microwave plasma enhanced deposition facilities (ASTeX HPMM and ECR plasma deposition chambers)

  2. Novel inductively coupled pulsed plasma research chamber

  3. FTIR spectrometers

  4. micro-Raman/photoluminescence spectrometer (Renishaw with Ar ion and 532 nm excitation sources.

  5. A Lambda Physik 210i Excimer laser, a Quantel Nd/YAG laser, a Lambda Physik LPD 3002E dye laser, and auto-tracking frequency doubling system

  6. Quadruple mass spectrometer insitu sampling system (Hiden) with automated data acquisition.
  7. A cw q-switched YAG laser machining facility for cutting diamond films

  8. A novel rf inductively coupled pulsed plasma source for CVD, etching, and material modification

Optical Surface Studies Chamber

  1. Multiple internal reflection IR
  2. Reflection absorption IR
  3. Transmission IR
  4. Auger electron spectroscopy
  5. Quadruple mass spectrometer
  6. Low Energy Electron Diffraction
  7. Quartz Crystal Microbalance
  8.  In-situ four point electrical probe for electrical measurements


UHV surface analytical facilities within the Division include Scanning Electron Microscopy (SEM) Transmission Electron Microscopy (TEM), Scanning Tunneling Microscopy (STM), Atomic Force Microscopy (AFM), Small spot XPS, and Scanning Auger Microscopy.

An Environment Scanning Electron Microscope with

  1. In-situ Raman and Photoluminescence measurement
  2. In-situ Cathodoluminescence Spectroscopy and Imaging
  3. Liquid nitrogen cooled stage

A 3-cm Kaufmann ion gun for sputtering deposition and ion milling


A DC plasma CVD chamber for carbon nanotube growth

 
   
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