Facilities

• Nanoprobe UHV Chamber with variable temperature stage under 4 independent STMs,
  
  
• High resolution SEM, Scanning Auger Microprobe System is coupled to 2nd UHV chamber with variable temperature
  
  
• STM/AFM, XPS, LEED, other surface analytical tools.
  
  
• Inverted fluorescence microscope coupled to a femtosecond laser and imaging spectrometer with sensitive CCD camera,
  
  
• Instrumentation for measuring time-correlated single-photon fluorescence decays, and scanning multiphoton excitation for wide-bandgap materials.
  
  
• UHV preparation and analysis chambers and instrumentation for excited-state photoemission and time-resolved laser-induced luminescence.
  
  
• Chemical vapor deposition systems for carbon nanotubes, Si nanowires, GaN nanowires.
  
  
• Electrical measurement apparatus for 2 and 4-point I-V measurements, Labview controlled
  
  
• Dielectrophoresis apparatus for selected deposition of nanotubes and nanowires
  
  
• High power sonicator
  
  
• ICP-OES/ICP-MS facilities for ppt elemental analysis
  
  
• Surface Analytical Chamber UHV load-locked to a CVD chamber, containing:
  
  
  1. High Resolution Electron Energy Loss Spectroscopy
     
  2. Auger Electron Spectroscopy
     
  3. X-ray Photoelectron Spectroscopy
     
  4. Reverse View Low Energy Electron Diffraction
     
     
  5. Residual Gas Analysis (Quadruple Mass Spectrometer)
     
  6. Differentially pumped Sputter Gun
     
  7. Variable temperature sample stage (100 to 1200K)
     
  8. Optical access for in-situ diagnostics
     
  9. Kelvin Probe
     
  10. In-situ four point electrical probe for electrical measurements
      
  11. UHV 4 pot metal evaporator