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UHV Surface Science and IR Spectroscopy


Ultra-High-Vacuum Surface Science

Dr. Victor Bermudez, victor.bermudez@nrl.navy.mil


Left Panel: Surface-sensitive ELS data (in first-derivative form for β-Si3N4 showing the removal of a surface-state feature at 4.6cV when the clean surface is given a small O2 exposure (2x10-5 Torr-sec). The interband peak at 6.4eV and the volume pasmon loss at 19.3eV are unaffected by O2 exposure.
Right Panel: Computed surface band structure for the β-Si3N4 surface showing an empty surface at 4.3cV above the valence band maximum. This state is derived from the anti-bonding π* orbitals of Si=N groups formed on the clean surface.

Recent effort in the area of UHV surface science has focused on the wide-bandgap semiconductors GaN and SiC and insulators ß-Si3N4 and ß-Ga2O3. The interest is in the physical and electronic structure of the surfaces, chemisorption phenomena, metal contact formation and functionalization with organic species. The techniques used include ultraviolet and x-ray photo-emission spectroscopies, Auger electron spectroscopy, electron energy loss spectroscopy and low-energy electron diffraction. A fully-instrumented UHV chamber is available in-house for this work. Experiment and theory are closely coupled in this research. Ab initio calculations of surface energies, band structures, etc. are routinely performed to analyze the spectroscopic results.

2006

2005

2004

2003

2002


Surface Infrared Spectroscopy

Dr. Victor Bermudez, victor.bermudez@nrl.navy.mil


Left Panel: Infrared reflection-absorption spectra for a polycrystalline film of Si grown on a CoSi2 film on a Si(200) wafer. Data are shown for a series of XeF2 doses at room temperature. The various Si-F bending and stretching modes associated with SiF, SiF2 and SiF3 groups are labeled. With increasing dose, first SiF, then SiF2, and finally SiF3 are seen.
Right Panel: Data obtained under steady-state conditions in a constant flux of XeF2. Below ~500K all SiFx species are present. The etching reaction proceeds via Si → SiF → SiF2 → SiF3 → SiF4. The SiF4 is volatile but can be detected at 300K. Above ~600K, SiF2 desorbs rapidly and only SiF can be detected. Thus the etching mechanism is controlled by the thermal stability of adsorbed SiF2.

Infrared spectroscopy is being used to study the vibrational spectra of adsorbed species in vacuum, non-vacuum and liquid environments. The focus is on the study of surface reactions and on identifying both strongly-adsorbed stable species and also reaction intermediates and weakly-adsorbed moieties that are present only under steady-state conditions. The materials of interest are primarily semiconductors and dielectric materials in bulk, thin-film or nano-structure form. Experiments in vacuum or in the presence of gas-phase reagents use primarily reflection-absorption spectroscopy. In the latter case polarization modulation is used to suppress the effects of IR absorption by the gas-phase ambient. For materials in contact with liquid reagents, attenuated total reflection is used together with a specially-designed flow cell. Two FTIR spectrometers are available, one mated with a UHV chamber and one equipped with external optics for the flow-cell experiments. This work is supported by a capability for performing ab initio quantum-chemical calculations of the adsorbate vibrational modes.

2011

2010

2008

2006

2005

2003



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