Description: Thin film electronic ceramics will play a prominent role in the next generation of electronic devices. Pulsed laser deposition (PLD) is a versatile vapor deposition technique which has solved many of the problems associated with the growth of high quality ceramic thin films. PLD has demonstrated the ability to rapidly deposit epitaxial quality thin films with an extremely low defect density. PLD allows the growth of high quality ceramics at low temperatures, which enables the growth of materials on plastic substrates for flexible electronics. At NRL, this technique has been applied to a broad spectrum of ceramic systems to meet specific device application needs. Sophisticated analysis techniques are employed to characterize film phase, structure, morphology (X-ray diffraction, Rutherford backscattering, SEM, and TEM), and film-specific properties (resistance, polarization, magnetization, and optic).
- Growth of high quality films at lower temperatures
- Deposit transparent conductive oxides on plastic substrates for flexible display applications
- Synthesize transparent conductive oxide films with smooth surfaces, lower electrical resistivity, and very high transmission of light in the visible spectrum
- High temperature superconductors for high Q microwave filters and resonators
- Ferroelectrics for NVRAMS, DRAMS, optoelectronics, and MEMS
- Ferrites for circulators, filters, and magnetic recording
- Giant magnetoresistance for recording heads and magnetic sensors
- Transparent conductive oxides for displays and optically transparent electronics
- "Transparent Conductive F-Doped SnO2 Thin Films Grown by Pulsed Laser Deposition," Thin Solid Films (2007) doi:10.1016/j.tsf.2007.11.079.
- "Fabrication of Zr-N Codoped p-type ZnO Thin Films by Pulsed Laser Deposition," Applied Physics Letters 90 (2007) 203508-1 - 203508-3.
- "Transparent Conducting Oxide Thin Films." Pulsed Laser Deposition of Thin Films. Ed. R. Eason. Wiley-Interscience, 2007. p 239-260.
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