Pulsed Laser Deposition of Ceramic Films




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Description:

Thin film electronic ceramics will play a prominent role in the next generation of electronic devices. Pulsed laser deposition (PLD) is a versatile vapor deposition technique which has solved many of the problems associated with the growth of high quality ceramic thin films. PLD has demonstrated the ability to rapidly deposit epitaxial quality thin films with an extremely low defect density. PLD allows the growth of high quality ceramics at low temperatures, which enables the growth of materials on plastic substrates for flexible electronics. At NRL, this technique has been applied to a broad spectrum of ceramic systems to meet specific device application needs. Sophisticated analysis techniques are employed to characterize film phase, structure, morphology (X-ray diffraction, Rutherford backscattering, SEM, and TEM), and film-specific properties (resistance, polarization, magnetization, and optic).

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Contact:

Naval Research Laboratory
Technology Transfer Office, Code 1004
techtran@research.nrl.navy.mil

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